Atomic layer etching of (100)/(111) GaAs with chlorine and...

Surface and Coatings Technology 2008 Vol. 202; Iss. 22-23

Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam

Woong Sun Lim, Sang Duk Park, Byoung Jae Park, Geun Young Yeom
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Volume:
202
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2008.06.123
File:
PDF, 462 KB
english, 2008
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