Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1997 / 9 Vol. 15; Iss. 5
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Influence of the gas mixture on the reactive ion etching of InP in CH[sub 4]-H[sub 2] plasmas
Feurprier, Y.Volume:
15
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.589363
Date:
September, 1997
File:
PDF, 565 KB
english, 1997