Origin of the Excellent Thermal Stability of Al/Si-Based...

Materials Science Forum 2001 Vol. 353-356

Origin of the Excellent Thermal Stability of Al/Si-Based Ohmic Contacts to p-Type LPE 4H-SiC

Kassamakova, Liliana, Kakanakov, Roumen, Kassamakov, Ivan, Zekentes, K., Tsagaraki, Katerina, Atanasova, Genoveva
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Volume:
353-356
Year:
2001
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.353-356.251
File:
PDF, 407 KB
2001
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