Silicon carbide film deposition at low temperatures using...

Silicon carbide film deposition at low temperatures using monomethylsilane gas

Hitoshi Habuka, Hiroshi Ohmori, Yusuke Ando
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Volume:
204
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.surfcoat.2009.09.044
File:
PDF, 725 KB
english, 2010
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