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Modelling of sputtering yield amplification effect in reactive deposition of oxides
T. Kubart, T. Nyberg, A. Pflug, M. Siemers, M. Austgen, D. Koehl, M. Wuttig, S. BergVolume:
204
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2010.05.006
File:
PDF, 453 KB
english, 2010