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Electron shading damage enhancement due to nonuniform in-hole etch rate in deep contact-hole process
Jeongyun Lee, Seok-Nyeon Kim, Dong-Hwan Kim, Ilsub ChungVolume:
205
Year:
2010
Language:
english
Pages:
1
DOI:
10.1016/j.surfcoat.2010.08.027
File:
PDF, 1.15 MB
english, 2010