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Characteristics of Inter Poly Dielectric (IPD) Prepared by Plasma Oxidation Treatment of LP-CVD SiO2 Film
Kim, Jung-hwan, Kim, Yong-Seok, Jang, Byong-Hyun, Namkoong, Hyun, Lee, Woo-Sung, Leam, Hun-Hyoung, Nam, Seok-Woo, Kang, Chang-Jin, Ahn, Tae-HyukVolume:
1108
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1108-A09-05
Date:
January, 2008
File:
PDF, 73 KB
english, 2008