Development of the Novel Electron Bombardment Anneal System...

Materials Science Forum 2005 Vol. 483-485

Development of the Novel Electron Bombardment Anneal System (EBAS) for SiC Post Ion Implantation Anneal

Shibagaki, Masami, Kurematsu, Yasumi, Watanabe, Fumio, Haga, Shigetaka, Miura, Kuniaki, Suzuki, Tomoyuki, Satoh, Masataka
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Volume:
483-485
Year:
2005
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.483-485.609
File:
PDF, 344 KB
english, 2005
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