Focused Ga Ion Beam Etching of Si in Chlorine Gas
Komuro, Masanori, Watanabe, Norikazu, Hiroshima, HiroshiVolume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.2288
Date:
October, 1990
File:
PDF, 601 KB
1990