Quantitative study of oxygen enhancement of sputtered ion...

Quantitative study of oxygen enhancement of sputtered ion yields. I. Argon ion bombardment of a silicon surface with O2 flood

Klaus Franzreb, Jan Lörinčík, Peter Williams
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Volume:
573
Year:
2004
Language:
english
Pages:
19
DOI:
10.1016/j.susc.2004.10.001
File:
PDF, 540 KB
english, 2004
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