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Investigating the lateral motion of SiGe islands by selective chemical etching
G. Katsaros, A. Rastelli, M. Stoffel, G. Isella, H. von Känel, A.M. Bittner, J. Tersoff, U. Denker, O.G. Schmidt, G. Costantini, K. KernVolume:
600
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.susc.2006.04.027
File:
PDF, 314 KB
english, 2006