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Quantitative analysis of thermally induced desorption during halogen-etching of a silicon (1 1 1) surface
K. Shudo, T. Kirimura, Y. Tanaka, T. Ishikawa, M. TanakaVolume:
600
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.susc.2006.05.052
File:
PDF, 321 KB
english, 2006