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High Channel Mobility of MOSFET Fabricated on 4H-SiC (11-20) Face Using Wet Annealing
Endo, Takeshi, Okuno, Eiichi, Sakakibara, Toshio, Onda, ShoichiVolume:
600-603
Year:
2009
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.600-603.691
File:
PDF, 322 KB
english, 2009