Real-time monitoring of SiO2/Si(1 1 1) interlayer etching by Brewster-angle reflectometry
M. Lublow, H.J. LewerenzVolume:
602
Year:
2008
Language:
english
Pages:
11
DOI:
10.1016/j.susc.2008.03.001
File:
PDF, 1.51 MB
english, 2008