Control of the Interfacial Layer Thickness in Hafnium Oxide Gate Dielectric Grown by PECVD
Choi, Kyu-Jeong, Park, Jong-Bong, Yoon, Soon-GilVolume:
150
Year:
2003
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1556052
File:
PDF, 144 KB
english, 2003