Effect of Silicon Wafer In Situ...

Japanese Journal of Applied Physics 1991 / 12 Vol. 30; Iss. Part 1, No

Effect of Silicon Wafer In Situ Cleaning on the Chemical Structure of Ultrathin Silicon Oxide Film

Terada, Naozumi, Ogawa, Hiroki, Moriki, Kazunori, Teramoto, Akinobu, Makihara, Koji, Morita, Mizuho, Ohmi, Tadahiro, Hattori, Takeo
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Volume:
30
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.3584
Date:
December, 1991
File:
PDF, 948 KB
1991
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