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Excellent Passivation of p$^{+}$ Silicon Surfaces by Inline Plasma Enhanced Chemical Vapor Deposited SiO$_{x}$/AlO$_{x}$ Stacks
Lin, Fen, Duttagupta, Shubham, Shetty, Kishan D., Boreland, Matthew, Aberle, Armin G., Hoex, BramVolume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.10NA17
Date:
October, 2012
File:
PDF, 330 KB
english, 2012