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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - EUV resists based on tin-oxo clusters
Wallow, Thomas I., Hohle, Christoph K., Cardineau, Brian, Del Re, Ryan, Al-Mashat, Hashim, Marnell, Miles, Vockenhuber, Michaela, Ekinci, Yasin, Sarma, Chandra, Neisser, Mark, Freedman, Daniel A., BraVolume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2046536
File:
PDF, 875 KB
english, 2014