![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Accurate lithography hotspot detection based on PCA-SVM classifier with hierarchical data clustering
Sturtevant, John L., Capodieci, Luigi, Gao, Jhih-Rong, Yu, Bei, Pan, David Z.Volume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2045888
File:
PDF, 427 KB
english, 2014