SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - Black border with etched multilayer on EUV mask
Fukugami, Norihito, Matsui, Kazuaki, Watanabe, Genta, Isogawa, Takeshi, Kondo, Shinpei, Kodera, Yutaka, Sakata, Yo, Akima, Shinji, Kotani, Jun, Morimoto, Hiroaki, Tanaka, Tsuyoshi, Kato, KokoroVolume:
8441
Year:
2012
Language:
english
DOI:
10.1117/12.965536
File:
PDF, 1.37 MB
english, 2012