Diffusion Properties of Ion-Implanted Vanadium in...

Journal of The Electrochemical Society 2003 Vol. 150; Iss. 7

Diffusion Properties of Ion-Implanted Vanadium in PECVD-SiO[sub 2] and PECVD-SiN[sub x]

Isenberg, J., Reber, S., Warta, W.
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Volume:
150
Year:
2003
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1575741
File:
PDF, 159 KB
english, 2003
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