Hydrogen Evolution from Atomically Flat Si(111) Surfaces Exposed to 40% NH[sub 4]F, Oxygen-Free Water, or Wet Gas
Sawada, Yuuki, Tsujino, Kazuya, Matsumura, MichioVolume:
153
Year:
2006
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2360767
File:
PDF, 153 KB
english, 2006