Plasma Etching for the Application to Low-K Dielectrics...

Materials Science Forum 2007 Vol. 555

Plasma Etching for the Application to Low-K Dielectrics Devices

Lee, Jong Woo, Kim, Hyoun Woo, Han, J.W., Kim, Mok Soon, Yoo, Byung Don, Kim, M.H., Lee, C.H., Lee, C.H., Lim, Cheol Ho, Hwang, Sun Keun, Lee, C., Chung, D.J., Park, S.G., Lee, S.G., O, B.H., Kim, J.,
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Volume:
555
Year:
2007
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.555.113
File:
PDF, 292 KB
english, 2007
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