![](/img/cover-not-exists.png)
Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
Kim, Woo-Hee, Kim, Min-Kyu, Maeng, W. J., Gatineau, Julien, Pallem, Venkat, Dussarrat, Christian, Noori, Atif, Thompson, David, Chu, Schubert, Kim, HyungjunVolume:
158
Year:
2011
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3594766
File:
PDF, 670 KB
english, 2011