HfOx Thin Films for Resistive Memory Device by Use of...

MRS Proceedings 2007 / 1 Vol. 997

HfOx Thin Films for Resistive Memory Device by Use of Atomic Layer Deposition

Chen, Pang Shiu, Lee, Heng-Yuan, Wang, Ching-Chiun, Tsai, Ming-Jinn, Liu, Kou-Chen
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Volume:
997
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0997-I07-04
Date:
January, 2007
File:
PDF, 255 KB
english, 2007
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