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Reduction of The Phase Transition Temperature of TiSi2 on Si(111) Using a Ta Interlayer
Jung, Bokhee, Kim, Young Do, Yang, Woochul, Nemanich, R. J., Jeon, HyeongtagVolume:
564
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-564-59
Date:
January, 1999
File:
PDF, 2.65 MB
english, 1999