![](/img/cover-not-exists.png)
Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling
bin Mohamad, Zulfakri, Huda, Miftakhul, Komori, Takuya, Alip, Rosalena Irma, Zhang, Hui, Yin, You, Hosaka, SumioVolume:
596
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.596.92
Date:
December, 2013
File:
PDF, 652 KB
english, 2013