![](/img/cover-not-exists.png)
Interface Reaction Behavior between Mn and SiO2 Formed by RF Sputter Deposition
Bae, Byeong Taek, Nakano, Hideaki, Koike, JunichiVolume:
508
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.508.48
Date:
March, 2012
File:
PDF, 2.17 MB
english, 2012