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MOCVD Processes for Electronic Materials Adopting Bi(C6H5)3 Precursor
Bedoya, C., Condorelli, G. G., Anastasi, G., Lisoni, J., Wouters, D., Fragalà, I.L.Volume:
811
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-811-D3.21
Date:
January, 2004
File:
PDF, 635 KB
english, 2004