Diffusion of ion-implanted Boron and Silicon in Germanium

MRS Proceedings 2004 / 1 Vol. 809

Uppal, Suresh, Willoughby, A. F. W., Bonar, J. M., cowern, N. E. B., Morris, R. J. H., Dowsett, M. G.

How much do you like this book?

What’s the quality of the file?

Download the book for quality assessment

What’s the quality of the downloaded files?

Volume:

809

Language:

english

Journal:

MRS Proceedings

DOI:

10.1557/PROC-809-B8.10

Date:

January, 2004

File:

PDF, 115 KB

english, 2004

Conversion to is in progress

Conversion to is failed