Arsenic diffusion in Si and Si0.9Ge0.1 alloys: Effect of defect injection
Uppal, Suresh, Bonar, J. M., Zhang, Jing, Willoughby, A. F. W.Volume:
809
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-809-B9.3.1/C9.3
Date:
January, 2004
File:
PDF, 183 KB
english, 2004