Low-temperature Phosphorus Doping To Silicon Using Phosphorus-related Radicals
Hayakawa, Taro, Nakashima, Yuuki, Koyama, Koichi, Ohdaira, Keisuke, Matsumura, HidekiVolume:
1391
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2012.526
Date:
January, 2012
File:
PDF, 1.36 MB
english, 2012