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Scaling of Hafnium-based High-k Dielectrics
Triyoso, Dina H., Hegde, Rama I., Gregory, Rich, Gilmer, David C., Schaeffer, James K., Samavedam, Srikanth B., Kaushik, Vidya, Rochat, NevineVolume:
996
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0996-H03-01
Date:
January, 2007
File:
PDF, 1.41 MB
english, 2007