Ruthenium Films Prepared by Liquid Source Chemical Vapor Deposition Using Bis-(ethylcyclopentadienyl)ruthenium
Aoyama, Tomonori, Eguchi, KazuhiroVolume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.L1134
Date:
October, 1999
File:
PDF, 243 KB
english, 1999