Lithography and doping in strained Si towards atomically...

Nanotechnology 2014 / 04 Vol. 25; Iss. 14

Lithography and doping in strained Si towards atomically precise device fabrication

Lee, W C T, McKibbin, S R, Thompson, D L, Xue, K, Scappucci, G, Bishop, N, Celler, G K, Carroll, M S, Simmons, M Y
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
25
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/25/14/145302
Date:
April, 2014
File:
PDF, 1.31 MB
english, 2014
Conversion to is in progress
Conversion to is failed