Stress Induced in Al2O3 Films as Deposited onto Al2O3TiC...

Advanced Materials Research 2012 / 12 Vol. 622-623

Stress Induced in Al2O3 Films as Deposited onto Al2O3TiC Substrate by RF Diode Sputtering

Panitchakan, H., Limsuwan, P.
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Volume:
622-623
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.622-623.716
Date:
December, 2012
File:
PDF, 360 KB
english, 2012
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