Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide...

Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl 4 /O 2 /N 2 Gas Mixtures

Niu, Jinhai, Zhang, Zhihui, Fan, Hongyu, Yang, Qi, Liu, Dongping, Qiu, Jieshan
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
16
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/16/7/11
Date:
July, 2014
File:
PDF, 4.22 MB
english, 2014
Conversion to is in progress
Conversion to is failed