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Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl 4 /O 2 /N 2 Gas Mixtures
Niu, Jinhai, Zhang, Zhihui, Fan, Hongyu, Yang, Qi, Liu, Dongping, Qiu, JieshanVolume:
16
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/16/7/11
Date:
July, 2014
File:
PDF, 4.22 MB
english, 2014