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SiO[sub 2] Films Deposited by APCVD with a TEOS/Ozone Mixture and Its Application to the Gate Dielectric of TFTs
Kim, Jaehong, Jung, Sungwook, Jang, Kyungsoo, Park, Hyungsik, Cho, Jaehyun, Lee, Wonbaek, Gong, Daeyoung, Choi, Byoungdeog, Kim, Youngkuk, Park, Jinju, Kim, Kwangyeol, Yi, JunsinVolume:
157
Year:
2010
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3267039
File:
PDF, 689 KB
english, 2010