SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Characterization of extreme ultraviolet emission from tin-droplets irradiated with Nd:YAG laser plasmas
Aota, Tatsuya, Nakai, Yuki, Fujioka, Shinsuke, Fujiwara, Etsuo, Shimomura, Masashi, Nishimura, Hiroaki, Nishihara, Nobukatsu, Miyanaga, Noriaki, Izawa, Yasukazu, Mima, Kunioki, Schellenberg, Frank M.Volume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.771536
File:
PDF, 623 KB
english, 2008