Molecular Dynamics Calculation for Low-Energy Ion...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4B

Molecular Dynamics Calculation for Low-Energy Ion Implantation Process with Dynamic Annealing Effect

Kwon, Oh-Seob, Seo, Ji-Hyun, Kim, Ki-Dong, Won, Tae-Young
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2303
Date:
April, 2005
File:
PDF, 203 KB
english, 2005
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