[ECS 21st Symposium on Microelectronics Technology and Devices - Ouro Preto - MG - Brazil (August 28-September 1, 2006)] ECS Transactions - Use of Discharge at Near Atmospheric Pressure for DLC Films Etching
Marcuzzo, Jossano S., Urruchi, Wilfredo I., Massi, Marcos, Grigorov, Kornely, Maciel, Homero S.Volume:
4
Year:
2007
Language:
english
DOI:
10.1149/1.2813532
File:
PDF, 560 KB
english, 2007