Undercut Isolation—A Technique for Closely Spaced and Self-Aligned Metalization Patterns for MOS Integrated Circuits
Berglund, C. N., Clemens, J. T., Nicollian, E. H.Volume:
120
Year:
1973
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2403673
File:
PDF, 1.19 MB
english, 1973