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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - EUV resists comprised of main group organometallic oligomeric materials
Wallow, Thomas I., Hohle, Christoph K., Passarelli, James, Cardineau, Brian, Del Re, Ryan, Sortland, Miriam, Vockenhuber, Michaela, Ekinci, Yasin, Sarma, Chandra, Neisser, Mark, Freedman, Daniel A., BVolume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2046537
File:
PDF, 878 KB
english, 2014