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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Tightly bound ligands for hafnium nanoparticle EUV resists
Cardineau, Brian, Krysak, Marie, Trikeriotis, Markos, Giannelis, Emmanuel, Ober, Christopher K., Cho, Kyoungyong, Brainard, Robert, Naulleau, Patrick P., Wood II, Obert R.Volume:
8322
Year:
2012
Language:
english
DOI:
10.1117/12.917014
File:
PDF, 1.01 MB
english, 2012