In-depth low frequency noise evaluation of substrate...

Microelectronic Engineering 2015 / 11 Vol. 147

In-depth low frequency noise evaluation of substrate rotation and strain engineering in n-type triple gate SOI FinFETs

Doria, Rodrigo Trevisoli, de Souza, Márcio Alves Sodré, Martino, João Antonio, Simoen, Eddy, Claeys, Cor, Pavanello, Marcelo Antonio
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
147
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2015.04.056
Date:
November, 2015
File:
PDF, 867 KB
english, 2015
Conversion to is in progress
Conversion to is failed