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Modeling of Boron Diffusion and Segregation in Poly-Si/4H-SiC Structures
Mochizuki, Kazuhiro, Shimizu, Haruka, Yokoyama, NatsukiVolume:
645-648
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.645-648.243
Date:
April, 2010
File:
PDF, 330 KB
english, 2010