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Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing
Tatsumi, Tetsuya, Hayashi, Hisataka, Morishita, Satoshi, Noda, Shuichi, Okigawa, Mitsuru, Itabashi, Naoshi, Hikosaka, Yukinobu, Inoue, MasamiVolume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.2394
Date:
April, 1998
File:
PDF, 1.20 MB
1998