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Precise control over physical characteristics of Carbon Nanotubes by differential variation of Argon flow rate during Chemical Vapor Deposition processing: A systematic study on growth kinetics
Tripathi, Nishant, Mishra, Prabhash, Joshi, Bipin, Islam, S.S.Volume:
35
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2015.03.014
Date:
July, 2015
File:
PDF, 3.26 MB
english, 2015