Batch Processing Method to Deposit a-Si:H Films by PECVD

Materials Science Forum 2004 Vol. 455-456

Batch Processing Method to Deposit a-Si:H Films by PECVD

Raniero, Leandro, Águas, Hugo, Pereira, Luís, Fortunato, Elvira, Ferreira, Isabel, Martins, Rodrigo
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Volume:
455-456
Year:
2004
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.455-456.104
File:
PDF, 318 KB
2004
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