Analysis of the intensity of Cu I 465.11nm spectral line...

Optik - International Journal for Light and Electron Optics 2015 / 05 Vol. 126; Iss. 9-10

Analysis of the intensity of Cu I 465.11nm spectral line under optically thick conditions for laser induced copper plasma

He, Jian, Zhang, Qingguo, Zhao, Haili
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Volume:
126
Language:
english
Journal:
Optik - International Journal for Light and Electron Optics
DOI:
10.1016/j.ijleo.2015.02.019
Date:
May, 2015
File:
PDF, 358 KB
english, 2015
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